|
Item ID |
Photo |
Short Description |
Product Type / Details |
#
|
Price |
Notes |
Make |
Model |
|
|
$ |
|
|
84072
|
Electronic Measuremt
|
Electronic Measuremt |
TCR 60S18 |
in Power Supplies
EMI DC POWER SUPPLY 60V, 18A:Direct Current Power Supply
|
1
|
|
1,000.00 |
|
|
|
155418
|
Electronic Measuremt
|
Electronic Measuremt |
EMS 60-80 |
in Power Supplies
EMI DC POWER SUPPLY 60V, 80A:DC Power Supply
|
1
|
|
1,200.00 |
|
|
|
81996
|
Electronic Measuremt
|
Electronic Measuremt |
EMHP 10-1500-D |
in Power Supplies
EMI ELECTRONIC MEASUREMENTS DC POWER SUPPLY:Direct Current Power Supply
|
1
|
|
|
F* |
|
|
1001
|
ENI
|
ENI |
PL3 |
in Power Supplies
ENI POWER SYSTEMS PLASMALOC 3 RF GENERATOR POWER SUPPLY:Plasmaloc 3 RF Generator
|
1
|
|
|
|
|
|
102336
|
ENI
|
ENI |
OEM 12B |
in Power Supplies
ENI POWER SYSTEMS RF GENERATOR 1250W, 13.56 MHZ:Radio Frequency Generator
Acquired by MKS Instruments
Representative photo
|
1
|
|
|
|
|
|
151365
|
ENI
|
ENI |
OEM 12A |
in Power Supplies
ENI POWER SYSTEMS RF GENERATOR 1250W, 13.56 MHZ:Radio Frequency Generator
|
3
|
|
|
|
|
|
185506
|
ENI Power Systems
|
ENI Power Systems |
OEM-6AM-1B-21251 |
in Power Supplies
ENI POWER SYSTEMS RF POWER SUPPLY 13.56 MHz:RF Generator
|
3
|
|
|
|
|
|
993
|
ENI
|
ENI |
LPG12A-21051-50 |
in Power Supplies
ENI POWER SYSTEMS SOLID STATE RF GENERATOR POWER SUPPLY:Solid State RF Generator
|
4
|
|
2,500.00 |
F* |
|
|
91840
|
Equipe Technologies
|
Equipe Technologies |
ATM105-1-S-CE |
in Robotics
EQUIPE TECHNOLOGIES WAFER TRANSFER ROBOT AND ALIGNER:Wafer Transfer Robot and Aligner
|
1
|
|
|
|
|
|
71112
|
EVG
|
EVG |
EV640 |
in Wafer Fabrication Equipment
EV GROUP SMARTVIEW BOND ALIGNER:Wafer to Wafer Bond Aligner
|
1
|
|
|
|
|
|
148001
|
EVG
|
EVG |
Smartview Bond Aligner |
in Wafer Fabrication Equipment
EV GROUP SMARTVIEW® BOND ALIGNER:2005 SmartView® Semi-Automated Wafer-to-Wafer Bond Aligner The EV Group (EVG) Smartview® Bond aligner and EV Group (EVG) 540 Wafer Bonder are used in the production of MEMs and in the emerging fields of 3D IC Packaging and Through-Silicon Via (TSV) interconnects. A 3D integrated circuit (3D IC) is a single integrated circuit built by stacking silicon wafers and/or dies and interconnecting them vertically. This is achieved by persisly aligning devices on two silicon wafers and subsequently bonding them together. The result is they behave as a single device. By using TSV technology, 3D ICs can pack a great deal of functionality into a small “footprint.” This technology is not olny used in the production of MEMS, but also in the fabrication of CMOS image sensors, and memory devices.
|
1
|
|
|
|
|
|
43636
|
Hamatech
|
Hamatech |
104180 |
in Spray/Brush Scrubbers
HAMATECH AUTOMATIC SUBSTRATE CLEANER:Automatic Substrate Cleaner
|
1
|
|
|
F* |
|
|
41529
|
Headway
|
Headway |
CB15 |
in Photoresist Coaters
HEADWAY RESEARCH MANUAL PHOTORESIST SPIN COATER:Manual Photoresist Spin Coater
|
1
|
|
|
F* |
|
|
163850
|
Heraeus
|
Heraeus |
09751751 |
in Evaporation Tools
HERAEUS NOBLELIGHT INFRARED EMITTER ASSEMBLY:Infrared Emitter Assembly
|
1
|
|
|
|
|
|
94318
|
Hewlett Packard
|
Hewlett Packard |
6200B |
in Power Supplies
HEWLETT PACKARD 6200B:Dual Output Power Supply
|
1
|
|
300.00 |
|
|
|
102316
|
Hewlett Packard
|
Hewlett Packard |
6453A |
in Power Supplies
HEWLETT PACKARD DC POWER SUPPLY:Direct Current Power Supply
|
2
|
|
|
|
|
|
38552
|
Hewlett Packard
|
Hewlett Packard |
6644A |
in Power Supplies
Hewlett Packard DC POWER SUPPLY:Direct Current Power Supply
|
3
|
|
995.00 |
|
|
|
93772
|
Hewlett Packard
|
Hewlett Packard |
6633B |
in Power Supplies
HEWLETT PACKARD DC POWER SUPPLY 50V, 2A:DC Power Supply
|
1
|
|
1,500.00 |
|
|
|
6777
|
Hewlett Packard
|
Hewlett Packard |
6130C |
in Power Supplies
HEWLETT PACKARD DIGITAL VOLTAGE SOURCE:Digital Voltage Source
|
2
|
|
950.00 |
|
|
|
161017
|
Hewlett Packard
|
Hewlett Packard |
6012B |
in Power Supplies
HEWLETT PACKARD DIRECT CURRENT POWER SUPPLY:Direct Current Power Supply
|
1
|
|
|
|
|
|
6770
|
Hewlett Packard
|
Hewlett Packard |
6255A |
in Power Supplies
HEWLETT PACKARD DUAL OUTPUT DC POWER SUPPLY:Dual Output Direct Current Power Supply
|
1
|
|
450.00 |
|
|
|
6773
|
Hewlett Packard
|
Hewlett Packard |
6233A |
in Power Supplies
HEWLETT PACKARD DUAL OUTPUT DC POWER SUPPLY:Dual Output Direct Current Power Supply
|
1
|
|
450.00 |
|
|
|
47344
|
Hewlett Packard
|
Hewlett Packard |
6624A (4) Output |
in Power Supplies
HP DC POWER SUPPLY:Direct Current Power Supply
|
1
|
|
1,350.00 |
F* |
|
|
32822
|
Hewlett Packard
|
Hewlett Packard |
6622A |
in Power Supplies
HP DC POWER SUPPLY 20V, 4A:Direct Current Power Supply
|
1
|
|
1,495.00 |
|
|
|
79491
|
Hewlett Packard
|
Hewlett Packard |
6266B |
in Power Supplies
HP DC POWER SUPPLY 40V, 5A:Direct Current Power Supply
|
1
|
|
450.00 |
|
|
|
47349
|
Hewlett Packard
|
Hewlett Packard |
6551A |
in Power Supplies
HP DC POWER SUPPLY 8V, 50A:Direct Current Power Supply
|
1
|
|
1,250.00 |
|
|
|
206648
|
Imtec Acculine
|
Imtec Acculine |
QZ-A1502 |
in Wet Processing Equipment
IMTEC ACCUBATH CONSTANT TEMPERATURE QUARTZ BATH:Constant Temperature Bath
|
1
|
|
1,575.00 |
F* |
|
|
206630
|
Imtec Acculine
|
Imtec Acculine |
QRT/S-A1502 |
in Wet Processing Equipment
IMTEC ACCUBATH QUARTZ PROCESS BATH:Recirculating Quartz Bath
|
1
|
|
1,850.00 |
|
|
|
142698
|
Inficon
|
Inficon |
782-900-030 |
in Physical Vapor Deposition Equipment
INFICON OPTICAL DETECTOR:Optical Detector
Inficon Guardian IV, 782-900-030
|
2
|
|
3,310.00 |
|
|
|
63730
|
Inficon
|
Inficon |
SENTINEL III |
in Physical Vapor Deposition Equipment
INFICON THIN FILM DEPOSITION CONTROLLER:Thin Flim Deposition Controller
Uses EIES sensor technology and provides complete automatic control of two materials, either sequential or codeposited vacuum processes
|
1
|
|
|
F* |
|
|
160726
|
Interlab
|
Interlab |
MRS1583 |
in Wafer Cleaners
INTERLAB MICRO RINSE SYSTEM:Micro Rinse System
|
1
|
|
|
|
|
|
186705
|
ITEC Powertron
|
ITEC Powertron |
3000S-CR |
in Power Supplies
ITEC POWERTRON 1500 WATT CURRENT SOURCE:Current Source
|
5
|
|
|
|
|
|
186707
|
ITEC Powertron
|
ITEC Powertron |
1500S-CRH |
in Power Supplies
ITEC POWERTRON 750 WATT CURRENT SOURCE:Current Source
|
1
|
|
|
|
|
|
142856
|
Japan Radio Co.
|
Japan Radio Co. |
NAH-1030-2A/NFC-30-2A |
in Power Supplies
JAPAN RADIO CO. RF GENERATOR/MATCHING NETWORK:RF Generator/Matching Network
|
2
|
|
|
|
|
|
112607
|
Karl Suss
|
Karl Suss |
MA 150M |
in Mask Aligners
KARL SUSS MANUAL MASK ALIGNER 150 MM:Manual Mask Aligner
The Karl Suss MA 150M Manual Mask Aligner is a mask alignment and exposure system which offers unsurpassed precision and versatility when handling wafers up to 150 mm in diameter.
|
1
|
|
|
F* |
|
|
190950
|
Kaufman & Robinson I
|
Kaufman & Robinson I |
eH1000 HC/F |
in Ion Beam Equipment
KAUFMAN & ROBINSON END-HALL ION SOURCE WITH WATER COOLED FRONT PLATE:Gridless End-Hall Ion Source With Water Cooled Front Plate
|
1
|
|
|
F* |
|
|
186213
|
Keyence
|
Keyence |
MD-F3000W |
in Lasers
KEYENCE HIGH POWER FIBER LASER MARKER 30W:Fiber Laser Marker
The optimum fiber laser marker solution for black-color marking and engraving on metal where a high output power is required
|
1
|
|
|
F* |
|
|
34890
|
LAM Research Co
|
LAM Research Co |
490 AUTO ETCH |
in Single Chamber Plasma Tools
LAM RESEARCH SIX INCH NITRIDE ETCHER:Six Inch Nitride Etcher
Automated Cassette to Cassette single wafer etching.
|
1
|
|
|
F* |
|
|
245029
|
Electronic Measuremt
|
Electronic Measuremt |
EMS 250-10-2-D |
in Power Supplies
LAMBDA ELECTRONIC MEASUREMENTS INC DC POWER SUPPLY 250V, 10A:DC Power Supply
|
1
|
|
1,450.00 |
|
|
|
182177
|
Electronic Measuremt
|
Electronic Measuremt |
EMS 5-50 |
in Power Supplies
LAMBDA ELECTRONIC MEASUREMENTS INC DC POWER SUPPLY 5V, 50A:DC Power Supply
|
1
|
|
500.00 |
|
|
|
190755
|
Electronic Measuremt
|
Electronic Measuremt |
EMS 80-30-2-D-10T-1402 |
in Power Supplies
LAMBDA ELECTRONIC MEASUREMENTS INC DC POWER SUPPLY 80V, 30A:DC Power Supply
|
1
|
|
1,450.00 |
|
|
|
209846
|
Lambda
|
Lambda |
ESS 160-62-2-D |
in Power Supplies
LAMBDA EMI DC POWER SUPPLY 160V, 62A:Direct Current Power Supply
|
1
|
|
3,250.00 |
|
|
|
244847
|
Lambda
|
Lambda |
ESS 20-250-2-D |
in Power Supplies
LAMBDA EMI DC POWER SUPPLY 20V, 250A:Direct Current Power Supply
|
2
|
|
1,850.00 |
|
|
|
242600
|
Electronic Measuremt
|
Electronic Measuremt |
EMS 40-25-2-D |
in Power Supplies
LAMBDA EMI DC POWER SUPPLY 40 V, 25 A:DC Power Supply
Lambda/Electronic Measurement Inc. EMS 40-25
|
1
|
|
|
|
|
|
242601
|
Electronic Measuremt
|
Electronic Measuremt |
EMS 600-1.6-2D 1286 |
in Power Supplies
LAMBDA EMI DC POWER SUPPLY 600 V, 1.6 A:DC Power Supply
Lambda/Electronic Measurement Inc. EMS 600-1.6
|
2
|
|
|
|
|
|
241958
|
Electronic Measuremt
|
Electronic Measuremt |
EMS 7.5-300-2-D |
in Power Supplies
LAMBDA EMI DC POWER SUPPLY 7.5 V, 300 A:DC Power Supply
Lambda/Electronic Measurement Inc. EMS 7.5-300
|
3
|
|
2,100.00 |
|
|
|
234820
|
Lambda
|
Lambda |
ESS 80-185-2-D-0969 |
in Power Supplies
LAMBDA EMI DC POWER SUPPLY 80V, 185A:Direct Current Power Supply
|
1
|
|
3,450.00 |
|
|
|
178848
|
Lambda
|
Lambda |
ESS 80-185-7-D-0806 |
in Power Supplies
LAMBDA EMI DC POWER SUPPLY 80V, 185A:Direct Current Power Supply
|
4
|
|
3,450.00 |
|
|
|
105546
|
Electronic Measuremt
|
Electronic Measuremt |
ESS 80-185-10-D-CE-1256 |
in Power Supplies
LAMBDA EMI DC POWER SUPPLY 80V, 185A:Direct Current Power Supply
|
1
|
|
3,450.00 |
F* |
|
|
245226
|
Leatherwood Plastics
|
Leatherwood Plastics |
LPAC100.SS.X |
in Wafer Cleaners
LEATHERWOOD PLASTICS 6' SOLVENT BENCH REAR EXHAUST: With Fire Suppression System by Mark Systems
|
1
|
|
|
|
|
|
36660
|
Leybold
|
Leybold |
LAB 600 EB |
in Evaporation Tools
LEYBOLD E-BEAM EVAPORATOR, 4 POCKET:E-Beam Evaporator with Ion Source
|
1
|
|
|
F* |
|
|
151338
|
Logitech
|
Logitech |
BC1 |
in Wafer Fabrication Equipment
LOGITECH WAFER BONDER CONTROLLER:Wafer Bonder Controller
|
1
|
|
|
|
|
|
85387
|
Lufran
|
Lufran |
SB5-403-A11 |
in Wet Processing Equipment
LUFRAN PROCESS TANK/HEATER/PROCESS CONTROLLER:Process Tank/Heater/Process Controller
Compatible with sulphuric, nitric or acetic acids, various strippers even KOH and HF.
|
2
|
|
3,000.00 |
|
|
|
103541
|
MA Lighting Technolo
|
MA Lighting Technolo |
12 X 3.7kW |
in Power Supplies
MA LIGHTING TECHNOLOGY DIGITAL LIGHT DIMMER:Digital Light Dimmer
|
2
|
|
|
F* |
|
|
85226
|
MAGNETRON HEAD PK 90
|
MAGNETRON HEAD PK 90 |
in Evaporation Tools
MAGNETRON HEAD PK 90:Magnetron Head
|
1
|
|
|
|
|
|
140569
|
MAGNETRON SPUTTERING CATHODE 6" x 40"
|
MAGNETRON SPUTTERING CATHODE 6" x 40" |
in Evaporation Tools
MAGNETRON SPUTTERING CATHODE 6" x 40":Magnetron Sputtering Cathode
Manufacturer Unknown
|
1
|
|
|
F* |
|
|
92507
|
MAGNETRON SPUTTERING CATHODE, 6"
|
MAGNETRON SPUTTERING CATHODE, 6" |
in Evaporation Tools
MAGNETRON SPUTTERING CATHODE, 6":Magnetron Sputtering Cathode
Manufacturer unknown
|
4
|
|
|
|
|
|
108528
|
March Instruments
|
March Instruments |
PM-600 |
in Plasma Etch Equipment
MARCH INSTRUMENTS BARREL PLASMA ETCHER 300 WATT:Barrel Plasma Etcher with Vacuum Pump March Instruments, manufacturer of plasma systems, was acquired by Nordson - called Nordson MARCH.
|
1
|
|
|
F* |
|
|
51482
|
March Instruments
|
March Instruments |
SUPERPLASMOD |
in Plasma Resist Strippers
MARCH INSTRUMENTS PLASMA CLEANER:Plasma Cleaner with 300W Power Supply
|
2
|
|
|
F* |
|
|
177136
|
March Instruments
|
March Instruments |
PX-2400 |
in Plasma Etch Equipment
MARCH NORDSON BOX PLASMA ETCHER 1000 WATT 13.56 MHz:Box Plasma Etcher Applications "Gas plasma treatment provides a fast, efficient method for surface treatment and cleaning prior to wire bonding, die attach, encapsulation, conformal coating and other processes. Plasma processing enhances lamination bondstrength, improves wire bond strength and uniformity,promotes underfill adhesion and enhances die attach." Source -- March Nordson.
|
1
|
|
|
|
|
|
199963
|
March Instruments
|
March Instruments |
PX-500 |
in Plasma Etch Equipment
MARCH NORDSON BOX PLASMA ETCHER 600 WATT 13.56 MHZ:Box Plasma Etcher
|
1
|
|
|
F* |
|
|
100429
|
Materials Technology
|
Materials Technology |
02-01808 |
in Epitaxial Reactors
MATERIALS TECHNOLOGY CORPORATION BARREL SUSCEPTOR:EPI 3 1/4" Barrel Susceptor
MTC EPI Reactor Parts For 3 Inch Wafers
|
4
|
|
|
F* |
|
|
202650
|
MDC
|
MDC |
600-4T |
in Physical Vapor Deposition Equipment
MDC VACUUM CHAMBER FOUR WAY CROSS 8" CONFLAT:UHV Conflat Connections
|
1
|
|
2,850.00 |
F* |
|
|
81174
|
Melles Griot
|
Melles Griot |
06 DAL 203 |
in Lasers
MELLES GRIOT ALIGNMENT LASER DIODE:Alignment Laser Diode
|
1
|
|
198.00 |
F* |
|
|
59142
|
Metroline
|
Metroline |
M4L |
in Plasma Resist Strippers
METROLINE BOX PLASMA ETCHER:Box Plasma Etcher
|
1
|
|
|
F* |
|
|
151502
|
Mill Lane Eng
|
Mill Lane Eng |
Custom Research |
in Batch Sputtering Tools
MILL LANE DUAL CHAMBER RESEARCH SPUTTERING SYSTEM:Dual Chamber Research Sputtering System
|
1
|
|
|
F* |
|
|
1973
|
Mill Lane Eng
|
Mill Lane Eng |
4123 |
in Single Wafer Sputtering Tools
MILL LANE ENGINEERING REEL COATER :Reel Coater for Ribbon or Wire
The model 412-3 is a two-chamber reel to reel web coater which deposits metal or alloys on wire or ribbon substrates by sputtering from two magnetron targets arranged in a closely spaced book array. Capacity is based upon 4" ID x 12" OD x 3" wide wire/ribbon spools. Wire diameter up to 0.035" (.9mm) may be coated at speeds ranging between 2 and 40 feet per minute depending on the coating thickness desired. Constant wire speed and tension are controlled in conjunction with other parameters which enable unattended operation for extended periods. A second chamber provides plasma pre cleaning prior to entering the sputter zone through a conductance limiting tube which allows different gas compositions and pressures for cleaning and coating.
|
1
|
|
|
F* |
|
|
172359
|
Modutek
|
Modutek |
QA14-DA1 |
in Wet Processing Equipment
MODUTEK MODUBATH CONSTANT TEMPERATURE QUARTZ BATH:Constant Temperature Bath with MicroTemp Series Process Controller
QA Series
|
1
|
|
1,575.00 |
|
|
|
4071
|
MRC
|
MRC |
902 |
in Single Wafer Sputtering Tools
MRC IN-LINE SPUTTER ETCH SYSTEM:In-Line Sputter-Etch System
|
1
|
|
|
F* |
|
|
143041
|
National Electronic
|
National Electronic |
MH3.OW-SL |
in Power Supplies
NATIONAL ELECTRONICS/RICHARDSON MICROWAVE MAGNETRON HEAD:Microwave Magnetron Head
|
2
|
|
|
|
|
|
11074
|
Nexx Systems
|
Nexx Systems |
Cirrus 300 |
in Production Tools
NEXX SYSTEMS ECR PECVD RIE SYSTEM:Low Temperature CVD Using ECR Technology. Formerly PlasmaQuest Astex
This system is designed for the fluorination of DLC surfaces on various substrates. The ECR zone is produced by a Nd-Fe-B permanent magnet which produces a high magnetic field launch of the microwave energy. High magnetic field launch produces a highly stable and efficient ECR plasma. Nexx Systems Cirrus 300
|
1
|
|
|
F* |
|
|
242093
|
Osiris International
|
Osiris International |
DEFIXX 15m |
in Wafer Fabrication Equipment
OSIRIS INTERNATIONAL MANUAL WAFER DEBONDING TOOL:Manual Wafer Debonding Tool
|
1
|
|
|
F* |
|
|
181540
|
Oxford Instruments
|
Oxford Instruments |
Plasmalab System 100 |
in Production Tools
OXFORD INSTRUMENTS PLASMALAB 100 PECVD:PECVD TEOS Tool with Load Lock
NB: System needs a computer-software upgrade. Selling this system AS IS, WHERE IS.
|
1
|
|
|
F* |
|
|
208462
|
Plasma-finish
|
Plasma-finish |
V15G |
in Plasma Etch Equipment
PLASMA-FINISH GMBH PLASMA ETCHER SYSTEM 300 WATT:Plasma Box Etcher System PINK GmbH acquired Plasma-Finish - now called PINK GmbH Plasma-Finish
|
1
|
|
|
|
|
|
3011
|
Plasma-Therm
|
Plasma-Therm |
Wafer Batch 740/740 |
in Single Chamber Plasma Tools
PLASMA-THERM DUAL PLASMA ETCH AND REACTIVE ION ETCH SYSTEM 200MM:Dual Plasma Etch and Reactive Ion Etch Processing Systems
System consists of a process chamber, upper electrode (with gas feed), and substrate electrode.
|
1
|
|
|
|
|
|
4054
|
Plasma-Therm
|
Plasma-Therm |
73/74 |
in Single Chamber Plasma Tools
PLASMA-THERM PECVD AND DUAL PLASMA ETCH/REACTIVE ION ETCH SYSTEM:Combination PECVD and Dual Plasma Etch/Reactive Ion Etch Processing Systems
|
1
|
|
|
|
|
|
50854
|
Plasma-Therm
|
Plasma-Therm |
VII 734 |
in Single Chamber Plasma Tools
PLASMA-THERM PLASMA DEPOSITION SYSTEM/RIE:Combination Plasma Deposition System/RIE
|
1
|
|
|
F* |
|
|
11919
|
Plasma-Therm
|
Plasma-Therm |
VII 734MF |
in Single Chamber Plasma Tools
PLASMA-THERM REACTIVE ION ETCH/PLASMA ETCH SYSTEM:Plasmatherm RIE/Plasma Etch System
|
1
|
|
|
F* |
|
|
206582
|
Plasma-Therm
|
Plasma-Therm |
BT 6" RIE MF |
in Single Chamber Plasma Tools
PLASMATHERM BatchTop VII REACTIVE ION ETCH SYSTEM 6":Reactive Ion Etch System BatchTop VII
|
1
|
|
|
|
|
|
45428
|
Plasma-Therm
|
Plasma-Therm |
790 ICP |
in Single Chamber Plasma Tools
PLASMATHERM ICP PLASMA ETCHER:Inductively Coupled Plasma Etcher with 9.5 Inch Electrode
|
1
|
|
|
F* |
|
|
201152
|
Plasma-Therm
|
Plasma-Therm |
790 RIE PECVD 11" |
in Single Chamber Plasma Tools
PLASMATHERM RIE PECVD MOUNTED IN GLOVEBOX:Reactive Ion Etch / PECVD system mounted in glovebox with an intregrated air purfier O2 and H20 sensors on board.
Both top and bottom electrodes can be powered sequentially.
|
1
|
|
|
|
|
|
142821
|
Plasma-Therm
|
Plasma-Therm |
Unaxis 790 |
in Single Chamber Plasma Tools
PLASMATHERM UNAXIS DUAL CHAMBER SHUTTLE LOAD LOCK SYSTEM:Shuttle Load Lock System
|
1
|
|
|
|
|
|
30246
|
Plasma-Therm
|
Plasma-Therm |
VLR 700 VLR-PM1-ICRB-PM |
in Production Tools
PLASMATHERM VLR 700:Single Chamber PECVD. Mixed Frequency Deposition (MFD) Both High Frequency (13.56 MHz) and Low Frequency (50-460 kHz) RF power delivered both electrodes.
|
1
|
|
|
F* |
|
|
223090
|
CBI
|
CBI |
2X2LOTO15 |
in Physical Vapor Deposition Equipment
Pneumatic Lockout Tagout Box - 15 Channel:Custom fabricated assembly designed to be installed into a raised floor system.
|
10
|
|
|
|
|
|
140735
|
Power Ten Inc
|
Power Ten Inc |
P62B-8250 |
in Power Supplies
POWER TEN DIRECT CURRENT POWER SUPPLY 8 V, 250 A:Direct Current Power Supply
Acquired by Elgar Electronics Corporation
|
1
|
|
1,730.00 |
|
|
|
83028
|
Power Ten Inc
|
Power Ten Inc |
P63C-15220AB |
in Power Supplies
POWER TEN INC. DC POWER SUPPLY 15V, 220A:Direct Current Power Supply
Acquired by Elgar Electronics Corporation
|
1
|
|
1,750.00 |
|
|
|
39613
|
Power Ten Inc
|
Power Ten Inc |
P62B-20150 |
in Power Supplies
POWER TEN INC. DC POWER SUPPLY 20V, 150A:Direct Current Power Supply
Acquired by Elgar Electronics Corporation
|
1
|
|
1,585.00 |
|
|
|
83027
|
Power Ten Inc
|
Power Ten Inc |
P62B-5325AB |
in Power Supplies
POWER TEN INC. DC POWER SUPPLY 5V, 325A:Direct Current Power Supply
Acquired by Elgar Electronics Corporation
|
2
|
|
1,450.00 |
|
|
|
242605
|
Power Ten Inc
|
Power Ten Inc |
P66C-60330AB |
in Power Supplies
POWER TEN INC. DC POWER SUPPLY 60V, 330A:Direct Current Power Supply
Acquired by Elgar Electronics Corporation
|
1
|
|
|
|
|
|
102308
|
Power Ten Inc
|
Power Ten Inc |
4500C-6040 |
in Power Supplies
POWER TEN INC. DC POWER SUPPLY 60V, 40A:Direct Current Power Supply
Acquired by Elgar Electronics Corporation
|
2
|
|
|
|
|
|
230353
|
Advanced Energy
|
Advanced Energy |
B0111-DPXX-105-XX |
in Power Supplies
Profibus communication board for Advanced Energy CESAR generators:Profibus communication board for Advanced Energy CESAR generators
|
5
|
|
|
|
|
|
160264
|
Quintel
|
Quintel |
Q-804 |
in Mask Aligners
QUINTEL MASK ALIGNER/EXPOSURE SYSTEM:Mask Aligner/Exposure System
|
1
|
|
|
F* |
|
|
24564
|
Quintel
|
Quintel |
UL 7000 IR |
in Mask Aligners
QUINTEL-NEUTRONIX MASK ALIGNER 200 MM:Mask Aligner with IR Backside Alignment
Quintel acquired by Neutronix
|
1
|
|
|
F* |
|
|
187522
|
Reynoldstech
|
Reynoldstech |
Custom |
in Wafer Fabrication Equipment
REYNOLDSTECH 16 'X 16', HOT PLATE 200° C, :200° C 16 " x 16" Hot Plate with Vacuum Hold Down
|
1
|
|
5,750.00 |
|
|
|
181396
|
Reynoldstech
|
Reynoldstech |
Resist Develop Station |
in Wafer Cleaners
REYNOLDSTECH PHOTORESIST DEVELOP HOOD:Photoresist Develop Station with Headway Wafer Spin Cleaner
|
1
|
|
|
F* |
|
|
191060
|
SemiSoft Inc.
|
SemiSoft Inc. |
MProbe VIS20 In-situ |
in Physical Vapor Deposition Equipment
SEMICONSOFT THIN FILM MEASUREMENT SYSTEM VIS:Thin Film Measurement System
The MProbe 20VIS is a desktop thin-film thickness measurement system. The measurement is based on spectroscopic reflectance and uses fiber optics retro-reflecting probe.
|
1
|
|
|
|
|
|
186319
|
Semitool
|
Semitool |
ST-260D |
in Wafer Cleaners
SEMITOOL RHETECH SPIN RINSE DRYER:Single Stack Table Top Spin Rinse Dryer
|
1
|
|
|
F* |
|
|
188065
|
Semitool
|
Semitool |
ST-240D |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER :Dual Stack Spin Rinse Dryer
|
1
|
|
|
F* |
|
|
135639
|
Semitool
|
Semitool |
4600L-5-2-E-VT |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER 380 MM:Large Area Substrate Spin Rinse Dryer
|
1
|
|
|
F* |
|
|
134446
|
Semitool
|
Semitool |
ST-240D |
in Wafer Cleaners
SEMITOOL SPIN RINSE DRYER 75 MM:Dual Stack Table Top Spin Rinse Dryer
|
1
|
|
|
F* |
|
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